High-quality AlN epitaxy on nano-patterned sapphire substrates prepared by nano-imprint lithography
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چکیده
منابع مشابه
High-quality AlN epitaxy on nano-patterned sapphire substrates prepared by nano-imprint lithography
We report epitaxial growth of AlN films with atomically flat surface on nano-patterned sapphire substrates (NPSS) prepared by nano-imprint lithography. The crystalline quality can be greatly improved by using the optimized 1-μm-period NPSS. The X-ray diffraction ω-scan full width at half maximum values for (0002) and (102) reflections are 171 and 205 arcsec, respectively. The optimized NPSS con...
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ژورنال
عنوان ژورنال: Scientific Reports
سال: 2016
ISSN: 2045-2322
DOI: 10.1038/srep35934